Chemical Vapor Deposition

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thin-films
Batch-Type-PECVD-sys
Batch Type PECVD
SYSKEY TECHNOLOGY Co., Ltd.
Batch Type PECVD
The batch type Plasma Enhanced Chemical Vapor Deposition (PECVD) can provide energy for deposition reaction.
Flexible substrate
thin-films
Diamond-Like-Carbon-sys
Diamond Like Carbon (DLC)
SYSKEY TECHNOLOGY Co., Ltd.
Diamond Like Carbon (DLC)
Diamond-like Carbons are formed from combining high concentrate sp3 bonding (Diamond) with low concentrate sp2 bonding.
Flexible substrate
thin-films
FPD-PECVD-sys
FPD-PECVD
SYSKEY TECHNOLOGY Co., Ltd.
FPD-PECVD
With the increase in size of LCD panels and glass need of manufacturing, manufacturing equipment has also become larger, requiring ever-larger equipment investm
up to 550 x 650 mm2 
thin-films
ICP-CVD-sys
ICP-CVD
SYSKEY TECHNOLOGY Co., Ltd.
ICP-CVD
This reaction at the surface is what forms the solid phase material. Low pressure is used to reduce of gas phase reactions, and also increases the uniformity ac
up to 12 inch wafers
thin-films
LPCVD-sys
LPCVD
SYSKEY TECHNOLOGY Co., Ltd.
LPCVD
It can provide some energy for the deposition reaction.
up to 8 inch wafers
thin-films
PECVD-sys
PECVD
SYSKEY TECHNOLOGY Co., Ltd.
PECVD
PECVD alternate for depositing a variety of thin films at lower temperatures than conventional CVD methods without losing film quality.
up to 12 inch wafers