Chemical Vapor Deposition

Categories

Batch Type PECVD

Diamond Like Carbon (DLC)

FPD-PECVD

ICP-CVD

LPCVD

PECVD
CVD (Chemical Vapor Deposition) is a process in which the substrate is exposed to one or more volatile precursors, reacting and decomposing on the substrate surface to create the desired thin film deposit. This method is often used to fabricate high quality, high performance, solid material in vacuum environment. Therefore, this process commonly used in the semiconductor industry to fabricate thin films.