Thin Films

Systems for thin films, ranging from CVD and ALD atomic layer
deposition to gas filters and heating elements for diffusion ovens.

All deposition

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thin-films
AT200
ALD Systems
ANR
AT200 ALD System

thin-films » Deposition » ALD Systems
The AT200M utilizes semiconductor grade components. Metal-sealed lines and a robust PLC driven user interface, fast cycling and high-quality single component th
Thin-Films
AT410
ALD Systems
ANR
AT410-1 ALD System

Thin-Films » Deposition » ALD Systems
Table-Top Atomic Layer Deposition ALD System, suitable for up to 5 lines. Substrate size up to 4" (100mm) diameter (Other Wafer Sizes on Request!)
Thin-Films
AT610
ALD Systems
ANR
AT610 ALD System

Thin-Films » Deposition » ALD Systems
Table-Top Atomic Layer Deposition ALD System, suitable for up to 5 lines. Substrate size up to 6" (150mm) diameter
thin-films
S-EBE-3
E-Beam Evaporation System
Syskey
3" E-Beam Evaporation System

thin-films » Deposition » E-Beam Evaporation System
Up to 3" (75mm)
Fully Automatic
< 3% Uniformity
Thin-Films
S-PE-CVD-6
PE-CVD System
Syskey
6" PE-CVD System (Plasma Enhanced)

Thin-Films » Deposition » PE-CVD System
Up to 6" (150mm)
Fully Automatic
< 3% Uniformity
Thin-Films
S-RIE-6
Reactive Ion Etch Systems
Syskey
6" Reactive Ion Etch System (Full Auto Control)

Thin-Films » Deposition » Reactive Ion Etch Systems
Up to 6" (150mm)
Fully Automatic
Thin-Films
S-RIE-8
Reactive Ion Etch Systems
Syskey
8" Reactive Ion Etch System (Full Auto Control)

Thin-Films » Deposition » Reactive Ion Etch Systems
Up to 8" (200mm)
Fully Automatic
thin-films
S-TE-3
Thermal Evaporation Systems
Syskey
3" Thermal Evaporation System

thin-films » Deposition » Thermal Evaporation Systems
Up to 3" (75mm)
Fully Automatic
< 3% Uniformity