Deposition | ALD Atomic Layer Deposition | PE-CVD Systems

The AT200M utilizes semiconductor grade components. Metal-sealed lines and a robust PLC driven user interface, fast cycling and high-quality single component th

Table-Top Atomic Layer Deposition ALD System, suitable for up to 5 lines. Substrate size up to 4" (100mm) diameter (Other Wafer Sizes on Request!)

Table-Top Atomic Layer Deposition ALD System, suitable for up to 5 lines. Substrate size up to 6" (150mm) diameter

This process allows fabricating the conformal thin films of various materials with atomic-scale control without high temperature required to deliver the necessa

In most ALD reactions, two chemicals are used as precursors. These precursors react with the material surface in a continuous and self-limiting manner.