Thin Films

Systems for thin films, ranging from CVD and ALD atomic layer
deposition to gas filters and heating elements for diffusion ovens.

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Deposition | ALD Atomic Layer Deposition | PE-CVD Systems

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thin-films
AT200
ALD Systems
ANRIC
AT200 ALD System
The AT200M utilizes semiconductor grade components. Metal-sealed lines and a robust PLC driven user interface, fast cycling and high-quality single component th
Thin-Films
AT410
ALD Systems
ANRIC
AT410-1 ALD System
Table-Top Atomic Layer Deposition ALD System, suitable for up to 5 lines. Substrate size up to 4" (100mm) diameter (Other Wafer Sizes on Request!)
Thin-Films
AT610
ALD Systems
ANRIC
AT610 ALD System
Table-Top Atomic Layer Deposition ALD System, suitable for up to 5 lines. Substrate size up to 6" (150mm) diameter
thin-films
AT650P
ALD Systems
ANRIC
AT650P ALD System
6"
Up to 400°C
Bench-top System
thin-films
AT650T
ALD Systems
ANRIC
AT650T ALD System
6"
Up to 400°C
Bench-top System
thin-films
Plasma-ALD-sys
Plasma ALD
Syskey
Plasma ALD
This process allows fabricating the conformal thin films of various materials with atomic-scale control without high temperature required to deliver the necessa
up to 12 inch
thin-films
Thermal-ALD-sys
Thermal ALD
Syskey
Thermal ALD
In most ALD reactions, two chemicals are used as precursors. These precursors react with the material surface in a continuous and self-limiting manner.
up to 300 mm