AT200M ALD system

Table-top Atomic Layer Deposition System 2 inch

Meet the smallest footprint ALD tool available on the market. The AT200M is specifically designed for simple operation and installation with a focus on educational and metrology markets where small size and cost effectiveness are the largest concerns.

The AT200M utilizes semiconductor grade components, metal-sealed lines and a robust PLC driven user interface that yields fast cycling and high-quality single component thin films while still realizing easy maintenance and safe. repeatable operation.

Features

• Small Footprint Desktop Thermal ALD system
• Stocked for immediate shipment. worldwide.
• Accommodates samples from 2" x 2" x 3" or two 2" round wafers (customizable chucks)
• 2 precursor ports with heat traced lines
• Vented precursor enclosure
• High temperature compatible fast pulsing ALD valves with ultrafast MFC for integrated inert gas purge - standard
• Up to 2 heated precursors
• All stainless-steel chamber with temperature range to 250C
• High exposure available with static processing mode
• 5" Display with integrated PLC control
• Lifetime SW upgrades included
• 1 year warranty (parts and labor included)