ANRIC
AT650P ALD System
ANRIC
AT650P ALD System
Plasma ALD at the cost of a thermal system
Warm walled aluminum chamber
High exposure available with static processing mode
Simple system maintenance and low utilities cost
The AT650P is a small footprint desktop plasma ALD tool with a streamlined chamber design and small chamber volume, while also offering fast cycling capability and high exposure for deep penetration processing.
The AT650P has a small footprint (15″ by 15″), bench-top installation and is fully cleanroom compatible. Its fast cycling capability and high exposure make deep penetration processing possible. Due to its simple system maintenance and low utilities cost, this tool is a very cost effective desktop plasma ALD system.
Features
- Smallest Footprint (15″ by 15″) Desktop Plasma ALD, fully cleanroom compatible
- Now with a new advanced hollow cathode source
- Featuring: low oxygen contamination (in nitrides, etc..), high electron density, low plasma damage
- Affordable Plasma ALD at the cost of a thermal system
- Simple system maintenance and low utilities cost
- Streamlined chamber design and small chamber volume
- Fast cycling capability and high exposure, deep penetration processing available
- Substrate temperatures from RT to 400°C ± 1 °C; Precursor temperatures from RT to 185°C ± 2°C (w/ heating jacket)
- Accommodates samples of 6" diameter with optional customizable chucks
- Warm walled aluminum chamber with heated sample holder from 40 – 400°C
- 3 organometallic sources (can be heated to 185°C with nitrogen assist), 1 at RT (upgradeable to 185°C) and up to 4 oxidant/ reductant sources
- High temperature compatible fast pulsing ALD valves with ultrafast MFC for integrated inert gas purge - standard
- Substrate temperature to 400°C
- High exposure available with static processing mode
- Integrated matching network
- Full HW and SW interlocks for safe operation even in multi-user environment
Options
- Customized chuck/platen
- QCM (Quartz Crystal Microbalance)
- Additional Counter reactant lines (MFC controlled) – up to 2 additional
- Optional 4th heated precursor (185°C)
- External control – PC/software link (allows programing and running, remotely)
- Higher than standard pressure regime
Brand
ANRIC
Product Number
AT650P
Substrate size
(6") 150 mm
Substrate temperature
Up to 400°C
System type
Bench-top System
Status
Request information