ALD Systems
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Thermal Evaporation Systems (1)Reactive Ion Etch Systems (2)
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thin-films
AT200
ALD Systems
ANR
The AT200M utilizes semiconductor grade components. Metal-sealed lines and a robust PLC driven user interface, fast cycling and high-quality single component th
Thin-Films
AT410
ALD Systems
ANR
Table-Top Atomic Layer Deposition ALD System, suitable for up to 5 lines. Substrate size up to 4" (100mm) diameter (Other Wafer Sizes on Request!)
Thin-Films
AT610
ALD Systems
ANR
Table-Top Atomic Layer Deposition ALD System, suitable for up to 5 lines. Substrate size up to 6" (150mm) diameter
