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Category
Material
0,394 mm PET (12 µm), AI (7 µm), PE (75 µm) & EPE (0,3 mm)
Anti-static layer | Polyester (12 µm) | Aluminum foil (7 µm) | Nylon (15 µm) | Polyethylene (115 µm) | Anti-static layer
Inner size
150 x 185 mm
180 x 230 mm
260 x 320 mm
380 x 420 mm
550 x 590 mm
620 x 650 x 175 mm
650 x 420 x 330 mm
770 x 650 x 175 mm
ESD Safe
Yes
Surface resistance
109-1010 Ohm (ANSI/ESD STM11-11)
Puncture strength
96.86-112.55 N (GB/T 39588-2020)
Tensile strength
54.16-70.19% (GB/T 39588-2020)
Cleanroom designation
ISO 3 (Class 1 FS209E)
Moisture Barrier Bags
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Refine
Category
Material
0,394 mm PET (12 µm), AI (7 µm), PE (75 µm) & EPE (0,3 mm)
Anti-static layer | Polyester (12 µm) | Aluminum foil (7 µm) | Nylon (15 µm) | Polyethylene (115 µm) | Anti-static layer
Inner size
150 x 185 mm
180 x 230 mm
260 x 320 mm
380 x 420 mm
550 x 590 mm
620 x 650 x 175 mm
650 x 420 x 330 mm
770 x 650 x 175 mm
ESD Safe
Yes
Surface resistance
109-1010 Ohm (ANSI/ESD STM11-11)
Puncture strength
96.86-112.55 N (GB/T 39588-2020)
Tensile strength
54.16-70.19% (GB/T 39588-2020)
Cleanroom designation
ISO 3 (Class 1 FS209E)
Apply filters
wafer-shipping
WHS-B-1001
Moisture Barrier Bags
Wafer handling products
The moisture barrier material has a moisture transmission rate which is sufficiently small to permit storage of semiconductor wafers within the volume for an ex
150 x 185 mm
Yes
109-1010 Ohm (ANSI/ESD STM11-11)
96.86-112.55 N (GB/T 39588-2020)
54.16-70.19% (GB/T 39588-2020)
ISO 3 (Class 1 FS209E)
wafer-shipping
WHS-B-1002
Moisture Barrier Bags
Wafer handling products
The moisture barrier material has a moisture transmission rate which is sufficiently small to permit storage of semiconductor wafers within the volume for an ex
180 x 230 mm
Yes
109-1010 Ohm (ANSI/ESD STM11-11)
96.86-112.55 N (GB/T 39588-2020)
54.16-70.19% (GB/T 39588-2020)
ISO 3 (Class 1 FS209E)
wafer-shipping
WHS-B-2003
Moisture Barrier Bags
Wafer handling products
The moisture barrier material has a moisture transmission rate which is sufficiently small to permit storage of semiconductor wafers within the volume for an ex
260 x 320 mm
Yes
109-1010 Ohm (ANSI/ESD STM11-11)
96.86-112.55 N (GB/T 39588-2020)
54.16-70.19% (GB/T 39588-2020)
ISO 3 (Class 1 FS209E)
wafer-shipping
WHS-B-2004
Moisture Barrier Bags
Wafer handling products
The moisture barrier material has a moisture transmission rate which is sufficiently small to permit storage of semiconductor wafers within the volume for an ex
380 x 420 mm
Yes
109-1010 Ohm (ANSI/ESD STM11-11)
96.86-112.55 N (GB/T 39588-2020)
54.16-70.19% (GB/T 39588-2020)
ISO 3 (Class 1 FS209E)
wafer-shipping
WHS-B-2005
Moisture Barrier Bags
Wafer handling products
The moisture barrier material has a moisture transmission rate which is sufficiently small to permit storage of semiconductor wafers within the volume for an ex
550 x 590 mm
Yes
109-1010 Ohm (ANSI/ESD STM11-11)
96.86-112.55 N (GB/T 39588-2020)
54.16-70.19% (GB/T 39588-2020)
ISO 3 (Class 1 FS209E)
wafer-shipping
WHS-B-2006
Moisture Barrier Bags
Wafer handling products
The moisture barrier material has a moisture transmission rate which is sufficiently small to permit storage of semiconductor wafers within the volume for an ex
770 x 650 x 175 mm
Yes
109-1010 Ohm (ANSI/ESD STM11-11)
96.86-112.55 N (GB/T 39588-2020)
54.16-70.19% (GB/T 39588-2020)
ISO 3 (Class 1 FS209E)
wafer-shipping
WHS-B-2007
Moisture Barrier Bags
Wafer handling products
The moisture barrier material has a moisture transmission rate which is sufficiently small to permit storage of semiconductor wafers within the volume for an ex
620 x 650 x 175 mm
Yes
109-1010 Ohm (ANSI/ESD STM11-11)
96.86-112.55 N (GB/T 39588-2020)
54.16-70.19% (GB/T 39588-2020)
ISO 3 (Class 1 FS209E)
wafer-shipping
WHS-B-4007
Moisture Barrier Bags
Wafer handling products
Our bags combine moisture barrier, EPE material and Aluminum Foil in one.
650 x 420 x 330 mm
Yes
ISO 3 (Class 1 FS209E)