Metal Thermal

The evaporation source using electric heating can be used to deposit most organic and inorganic thin films, among which the resistance Joule method is the most common.

Applications

• Metal materials research.
• Nano film.
• Solar-cell.

Configurations

• Flexible substrate size up to 12 inch wafer in diameter or 470 x 370 mm² glass.
• Full-width opening door (HV chamber) integrated two viewports with shutters for observing substrate and evaporation sources.
• Excellent thin-film uniformity of less than ±3%.
• Multiple sources with sequential operation or co-deposition.
• Substrate holder heating up to 800°C.
• Substrate rotation can improve thickness uniformity.
• Adjustable substrate to evaporation source spacing.
• Shutters are installed each evaporation source and substrate.

Chamber

• Flexible chamber sizes depend on substrate size and applications.
• Full-width opening door integrated two viewports with shutters for observing substrate and thermal sources.
• Ultimate vacuum of chamber about 10^-8 Torr.

Options

• Intergrated with Load-Lock, robot arm, glove box.
• Combined with Ion-source, for plasma cleaning or assisted deposition.
• Substrate cooling.
• Residual gas analy