Metal Thermal

Thermal evaporation system is the most common method of Physical Vapor Deposition (PVD). It is one of the simplest forms of PVD. The evaporation source using electric heating can be used to deposit most organic and inorganic thin films, among which the resistance Joule method is the most common. The advantage of these evaporation sources is that they can provide a simple method of thin film deposition, and current flows through the resistance element that needs to deposit material, thereby heating the material.