Mechanical Mask Pick Horizontal Grip

WHS-L2 Horizontal Offset Mask Handling Mechanical Pick

The WHS-L2 series is a precision-engineered, normally-closed (consistent-force) mechanical pick designed for horizontal offset grip handling of 5" to 9" photomasks. By gripping from the tangential edge, the WHS-L2 reduces contamination risks by eliminating contact with sensitive chrome surfaces, making it ideal for critical semiconductor processes.

Constructed from advanced materials, the WHS-L2 ensures long-lasting durability with antistatic properties and excellent chemical resistance. It is designed for use in ISO 3 (FS209E Class 1) cleanrooms, meeting the highest standards of cleanliness and contamination control.

The WHS-L2 is highly versatile and suited for a wide range of applications, including manual transfers of photomasks and reticles between storage boxes and production environments such as Reticle SMIF Pods, Nikon, and Canon reticle boxes. It is also ideal for macro integrity inspections during transfers, allowing operators to check for barcode IDs, particles, chrome defects, and damage to the pellicle frame or film. The tool is further optimized for use in mask aligners and metrology equipment.

The WHS-L2 ships with a specially designed tabletop pedestal holder that keeps the mask pick clean and protected from damage between uses, enhancing its longevity and maintaining performance.

Manufactured in an ISO9001 certified facility and CE certified, the WHS-L2 meets international quality and safety standards, offering a robust and reliable solution for photomask handling in semiconductor fabrication and mask shops.