+31 341 360 590sales@sps-international.com
Refine
Category
EUV mask pick
(1)
Ionizer
(2)
Horizontal mask pick
(1)
Side mask pick
(1)
Mask size
5x5x0.090
6x6x0.120
6x6x0.250
7x7x0.120
7x7x0.150
9x9x0.120
Material gripper
Antistatic Polyoxymethylene 
Material gripper insert
Viton elastomer
Grip Hold
Normally closed
Cleanliness
ISO 3 (Class 1 FS209E)

Horizontal mask pick

The WHS-L2 is a normally closed (consistent-force) mechanical pick for handling from 5" up to 9" square photomasks from the tangential edge to reduce contamination by eliminating contact with chrome. Advanced gripper manufacturing for longevity, antistatic properties, and general chemical resistance.

1product
Order by
Filter
photolithography
Mechanical Mask Pick Horizontal Grip
WHS-L2
Horizontal mask pick
Wafer handling products
Mechanical Mask Pick Horizontal Grip
WHS-L2 Serie MPH2 A normally closed (consistent-force) mechanical pick for handling from 5" up to 9" square photomasks from the tangential edge to red
Different sizes
Horizontal grip
View product
6 Sizes:
Mechanical Mask Pick Horizontal Grip 5x5x0.090 Photomasks and ReticlesMechanical Mask Pick Horizontal Grip 6x6x0.120 Photomasks and ReticlesMechanical Mask Pick Horizontal Grip 6x6x0.250 Photomasks and Reticles
More...