Wafer Cleaning Systems | In-Deck Spin Coaters | Probe Card

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Wetprocess
41367
Substrate Holder
POLOS
4" - 8" PTFE Double-sided substrate holder
wetprocess
SPIN150X-ADVANCED-INT
Spin process - 150 mm Integrators
POLOS
SPIN150x Advanced - Spin coater POLOS® - Integrator Model
Up to 6" (150 mm)
Up to 4" x 4" (100 mm)
Desktop version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW rotation and puddle option
2 Sizes:
SPIN150x Advanced - Spin coater POLOS® - Integrator Model NPPSPIN150x Advanced - Spin coater POLOS® - Integrator Model PTFE
wetprocess
SPIN150X-INT
Spin process - 150 mm Integrators
POLOS
SPIN150x Standard - Spin coater POLOS® - Integrator Model
Up to 6" (150 mm)
Up to 4" x 4" (100 mm)
Desktop version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW rotation and puddle option
2 Sizes:
SPIN150x Standard - Spin coater POLOS® - Integrator Model NPPSPIN150x Standard - Spin coater POLOS® - Integrator Model PTFE
wetprocess
SPIN200x-Advanced-INT
Spin process - 200 mm Integrators
POLOS
SPIN200x Advanced - Spin coater POLOS® - Integrator Model
2 Sizes:
SPIN200x Advanced - Spin coater POLOS® - Integrator Model NPPSPIN200x Advanced - Spin coater POLOS® - Integrator Model PTFE
wetprocess
SPIN200x-Standard-INT
Spin process - 200 mm Integrators
POLOS
SPIN200x Standard - Spin coater POLOS® - Integrator Model
Up to 8" (200 mm)
Up to 6" x 6" (150 mm)
In-Deck Version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW rotation and puddle option
2 Sizes:
SPIN200x Standard - Spin coater POLOS® - Integrator Model NPPSPIN200x Standard - Spin coater POLOS® - Integrator Model PTFE
wetprocess
SPIN300x-Advanced-INT
Spin process - 300 mm Integrators
POLOS
SPIN300x Advanced - Spin coater POLOS® - Integrator Model
2 Sizes:
SPIN300x Advanced - Spin coater POLOS® - Integrator Model NPPSPIN300x Advanced - Spin coater POLOS® - Integrator Model PTFE
Wetprocess
UH119
Wafer Cleaning
ULTRON SYSTEMS
UH119 Pressure Cleaning System
Up to 12" (300mm)
Semi-Automatic