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Wafer Cleaning Systems | In-Deck Spin Coaters | Probe Card
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Wetprocess
41367
Substrate Holder
POLOS
wetprocess
SPIN150X-INT
SPIN150x-200x In-Deck
POLOS
Up to 6" (150 mm)
Up to 4" x 4" (100 mm)
Desktop version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW rotation and puddle option
wetprocess
SPIN200x-Advanced-INT
SPIN200x Advanced In-Deck
POLOS
wetprocess
SPIN200x-INT
SPIN150x-200x In-Deck
POLOS
Up to 8" (200 mm)
Up to 6" x 6" (150 mm)
In-Deck Version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW rotation and puddle option
wetprocess
SPIN300x-Advanced-INT
SPIN300x Advanced In-Deck
POLOS
Wetprocess
UH119
Wafer Cleaning
ULTRON SYSTEMS
Up to 12" (300mm)
Semi-Automatic