Wafer Cleaning Systems | In-Deck Spin Coaters | Probe Card

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Wetprocess
41367
Substrate Holder
POLOS
4" - 8" PTFE Double-sided substrate holder
wetprocess
SPIN150X-INT
SPIN150x-200x In-Deck
POLOS
SPIN150x Spin coater In-Deck POLOS®
Up to 6" (150 mm)
Up to 4" x 4" (100 mm)
Desktop version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW rotation and puddle option
2 Sizes:
SPIN150x Spin coater In-Deck POLOS® NPPSPIN150x Spin coater In-Deck POLOS® PTFE
wetprocess
SPIN200x-Advanced-INT
SPIN200x Advanced In-Deck
POLOS
SPIN200x advanced spin coater in-deck POLOS®
2 Sizes:
SPIN200x advanced spin coater in-deck POLOS® NPPSPIN200x advanced spin coater in-deck POLOS® PTFE
wetprocess
SPIN200x-INT
SPIN150x-200x In-Deck
POLOS
SPIN200x Spin coater In-Deck POLOS®
Up to 8" (200 mm)
Up to 6" x 6" (150 mm)
In-Deck Version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW rotation and puddle option
2 Sizes:
SPIN200x Spin coater In-Deck POLOS® NPPSPIN200x Spin coater In-Deck POLOS® PTFE
wetprocess
SPIN300x-Advanced-INT
SPIN300x Advanced In-Deck
POLOS
SPIN300x advanced spin coater in-deck POLOS®
2 Sizes:
SPIN300x advanced spin coater in-deck POLOS® NPPSPIN300x advanced spin coater in-deck POLOS® PTFE
Wetprocess
UH119
Wafer Cleaning
ULTRON SYSTEMS
Up to 12" (300mm)
Semi-Automatic