ICP-RIE

Inductively coupled plasma (ICP) etching is based on the standard reactive ion etching (RIE) by adding the ICP. The inductively coupled plasma is provided by the field a coil surrounding the quartz crystal tube. The high density plasma is created, surrounded by the coil, and act as the secondary coil in a transformer, accelerating the electrons and ions, and thus causing collisions that produce even more ions and electrons.