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All plasma etching

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thin-films
ALE-sys
ALE
SYSKEY TECHNOLOGY Co., Ltd.
ALE
As the functional size of the device is further reduced, further use of ALE is required to achieve its required accuracy.
up to 12 inch
thin-films
ICP-RIE-sys
ICP-RIE
SYSKEY TECHNOLOGY Co., Ltd.
ICP-RIE
The high density plasma is created, surrounded by the coil, and act as the secondary coil in a transformer, accelerating the electrons and ions, and thus causin
up to 12 inch
thin-films
RIE-sys
RIE
SYSKEY TECHNOLOGY Co., Ltd.
RIE
The RIE process is a chemical physical etching process, and is the most important process for constructing various films in semiconductor manufacturing.
up to 12 inch