UHV Sputter

An UHV environment is characterized by pressures lower than 10^-8 ~10^-12 Torr and it is common in chemistry, physics, and engineering. For UHV environment, it is very important to scientific research, because experiments often require surfaces to be maintained in a contamination-free state for the duration of the process and use of low energy electron and ion-based experimental techniques without undue interference from gas phase scattering.