Magnetron sputter
Categories
Co-Sputter
FPD-PVD
In-Line Sputter
Multi-Layer Sputter
UHV Sputter
Sputtering deposition is a Physical Vapor Deposition (PVD) method of thin films deposition by sputtering material from a target, then depositing it onto a substrate. In this technique, the target source material is bombarded by Argon or Nitrogen plasma and the substrates are placed in front of the target at an appropriate distance.