Magnetron sputter

Categories

Co-Sputter

FPD-PVD

In-Line Sputter

Multi-Layer Sputter

UHV Sputter
Sputtering deposition is a Physical Vapor Deposition (PVD) method of thin films deposition by sputtering material from a target, then depositing it onto a substrate. In this technique, the target source material is bombarded by Argon or Nitrogen plasma and the substrates are placed in front of the target at an appropriate distance.