Magnetron sputter

Co-sputtering is simultaneous coating from two or multiple sputtering targets. It is used for compound - alloy or composite material.

In-Line Sputtering Deposition System is that substrates passed linearly beneath one or more sputter cathodes to acquire their thin film coating.

The high-quality multilayer films are becoming increasingly important in precision systems that single material thin film cannot practice the required specifica

For UHV environment, it is very important to scientific research, because experiments often require surfaces to be maintained in a contamination-free state for