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up to 8 inch wafer
UHV E-Beam
An ultra high-vacuum (UHV) E-beam deposition system is characterized by pressures lower than 10-8 ~10-12 Torr and it is common in chemistry, physics, and engineering.
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UHV-E-Beam-sys
UHV E-Beam
SYSKEY TECHNOLOGY Co., Ltd.
For UHV environment, it is very important to scientific research, because experiments often require surfaces to be maintained in a contamination-free state for
up to 8 inch wafer