Electron Beam Evaporation

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E-Beam Evaporation System

Lift-Off

UHV E-Beam
Electron beam deposition is a practical and highly reliable system. Our system can use a single large crucible for mass production, or multiple crucibles to achieve a multilayer film structure. We support semiconductor research and large equipment design. Planetary rotation design for single and multi-substrate can control the evaporation rate, the film thickness and uniformity is less than +/- 3%.