Thin Films

Systems for thin films, ranging from CVD and ALD atomic layer
deposition to gas filters and heating elements for diffusion ovens.

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up to 300 mm

Thermal ALD

The atomic layer deposition (ALD) system is a vapor-phase chemical deposition technique. It is one of the chemical vapor deposition methods.In most ALD reactions, two chemicals are used as precursors. These precursors react with the material surface in a continuous and self-limiting manner. By repeated exposure to the separated precursor, a thin film is slowly deposited. For thermal ALD requires relatively high temperatures (typically 150~350°C).

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Thermal ALD
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Thermal ALD thin-films » Deposition » Thermal ALD
In most ALD reactions, two chemicals are used as precursors. These precursors react with the material surface in a continuous and self-limiting manner.
up to 300 mm
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