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Plasma enhanced chemical vapor deposition (PECVD)
Plasma enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition (CVD) technology using a plasma to provide some of the energy for the deposition reaction to take place. PECVD alternate for depositing a variety of thin films at lower temperatures than conventional CVD methods without losing film quality.
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PECVD
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PECVD alternate for depositing a variety of thin films at lower temperatures than conventional CVD methods without losing film quality.