POLOS
POLOS HOTPLATE 350 Advanced
POLOS
POLOS HOTPLATE 350 Advanced
Suitable for soft bake and hard bake processes
Designed with a soft-close lid
Easily convertible into an indeck model
Programmable storage of 20 programs
Upgradeable options include: lifting pins, vacuum bake and proximity pins
Our table-top hotplate is a versatile and affordable tool for R&D and pilot lines. It is designed with a hinged lid with N2 connector and is suitable for soft bake as well as hard bake processes, and curing of photoresist, epoxy or any other work requiring precise temperature control. The POLOS® Hotplate 350 also has upgradeable options, including lifting pins, vacuum bake and proximity pins.
HOTPLATE 350 Advanced
- Temperature Range 50 - 230°C
- Programmable storage of 20 programs (Temperature/Time)
- Countdown timer (1-999 sec.) with acoustic alarm
- Temperature Uniformity ±1°C
- Heater Surface Area 350 x 350 mm
- Suitable for 1 x 300 mm Wafer
- Equipped with programmable (electric) Lifting Pins
- Equipped with Proximity Pins to hold the wafer above the heating plate while baking
- Equipped with perforated vacuum plate to realize a hard contact bake
- Power: max. 1200 W (approx. 550 W to remain at 200°C)
- Voltage: 230 VAC
- Heater Block Material: Aluminum (anodized)
- Housing Material: Powder coated steel
- Including Hinged Lid with N2 connection
- Weight: 20kg
