Our all NEW table-top hotplate is a versatile and affordable tool for R&D and pilot lines. It is designed with a soft-closed lid and is suitable for soft bake as well as hard bake processes, and curing of photoresist, epoxy or any other work requiring precise temperature control. The POLOS:reg; Hotplate 200 is also available as an advanced version. The advanced unit is standard equipped with complimentary features such as an N2 connector, lifting pins, vacuum bake, and proximity pins.
Easily convertible into an indeck model
Using our specially designed indeck bracket and display bracket, you can easily convert the POLOS® hotplate into an indeck solution.
HOTPLATE 200 Standard
Heater surface area 220 x 220 mm
Suitable for 1 x 200 mm wafer
Soft-close lid, enabling single-handed closing
Glove-friendly operation
Temperature range 50 - 230°C
Programmable storage of 20 programs (Temperature/Time)
