IEV mask grip - 6”x6”x0.250” (WHS-L3)

WHS-L3 EUV Pod Mechanical Reticle Pick

The WHS-L3-6250 is a precision-engineered mechanical pick specifically designed for the safe handling of advanced EUV reticles. With a 4-gripper, normally closed (consistent-force) side grip mechanism, the WHS-L3 securely handles 6”x6”x0.250” EUV reticles by gripping the tangential edge, minimizing contamination risks by avoiding direct contact with the sensitive chrome surfaces. This ensures the integrity of the reticles during critical semiconductor processes.

Engineered for compatibility with industry-standard EUV reticle storage pods, the WHS-L3 features advanced gripper manufacturing that provides enhanced durability, antistatic properties, and chemical resistance. The shortened and additional grippers offer superior control and protection for these delicate and high-value EUV reticles, making the WHS-L3 an indispensable tool for EUV photolithography applications.

Constructed for use in ISO 3 (FS209E Class 1) cleanroom environments, the WHS-L3 is built to withstand stringent contamination control requirements. The consistent-force mechanism provides even, gentle pressure on the reticle, reducing the risk of damage while ensuring safe and reliable handling.

The WHS-L3 comes with a specially designed tabletop pedestal holder, keeping the tool clean and protected when not in use, ensuring longevity and maintaining performance.

Manufactured in an ISO9001 certified facility and CE certified, the WHS-L3 meets international standards for quality and safety, offering a reliable solution for handling ultra-sensitive EUV reticles in semiconductor production environments.