FR-SCANNER-AIO-MIC-XY200 -Automated & fast mapping of films
FR-SCANNER-AIO-MIC-XY200 -Automated & fast mapping of films
Automated & Fast mapping of films in the micron lateral scale.
FR-Scanner-AllInOne-Mic-XY200 is a holistic platform for the fully-automated in-depth characterization of patterned single and multilayer coatings on wafers. It provides 200 mm of travel along X and Y axes and is suitable for accurate measurements while the sample is secured on the stage through vacuum. The tool is offered in an endless range of optical configurations within the 200 - 1700 nm spectral range.
FR-Scanner-AIO-Mic-XY200 integrates under the same roof state-of-the-art optical, electronic, and mechanical modules for the accurate & precise characterization of patterned films. Typical examples include (but are not limited to): micro-patterned surfaces, rough surfaces, and numerous others.
The wafer is placed on a vacuum chuck that supports any wafer size up to 200 mm diameter and is equipped with reflectance standards. The characterization is performed by a powerful optical module with a spot size as small as a few microns. The motorized XY stage provides travel of 200 mm on each axis with unprecedented speed, accuracy & repeatability.
FR-Scanner-AIO-Mic-XY200 provides:
- Real-time spectroscopic reflectance measurements
- Film thickness, optical properties, non-uniformity measurements, thickness mapping
- Imaging with an integrated high-quality color camera
- Wide range of statistics for the parameters under characterization
- Semi-automatic pattern alignment capability for mapping of periodic small patterns
- Unique S/W features such as: Click2Move, Scale bar and more
APPLICATIONS
- Universities & research labs
- Semiconductors (oxides, nitrides, Si, resists, etc.)
- MEMS devices (photoresists, Si membranes, etc.)
- LEDs, VCSELs
- Data storage
- Polymer coatings, adhesives, etc.
- And many more… (contact us with your requirements)
FEATURES
- Single-click analysis (no need for initial guess)
- Dynamic measurements
- Optical parameters (n & k, color)
- Click2Move & Pattern alignment functions
- Multiple installations for off-line analysis
- Free of-charge software update
PRINCIPLE OF OPERATION
White Light Reflectance Spectroscopy (WLRS) measures the amount of light reflected from a film or a multilayer stack over a spectral range, with the incident light normal (perpendicular) to the sample surface.
The measured reflectance spectrum, produced by interference from the interfaces is being used to determine the thickness, optical constants (n & k), etc. of free-standing and supported (on transparent or partially/fully reflective substrates) stack of films.