Photomask Handling

Introducing the WHS-L Series

Precision Photomask Handling & Reticle Handling: The WHS‑L Series

When handling expensive photomasks (also commonly referred to as photo masks) and advanced semiconductor reticles such as EUV reticles, precision and contamination control are non‑negotiable, especially in demanding photomask lithography processes. The WHS‑L lineup represents advanced photomask handling tools, delivering secure, ESD‑protected manipulation for all critical mask handling needs. These tools function as precise mechanical photomask picks.

WHS-L1 Standard Excellence

WHS-L2 Specialized Versatility

WHS-L3 Precision for EUV Masks

WHS‑L1: The Standard‑Duty Side Grip Photomask Pick

Featuring a side‑profile hold that keeps operators clear of the mask surface, the L1’s enclosed gearing safeguards against particle generation during photomask handling and provides smooth open/close action for general photomask transfers.

Tangential edge side grip for 5" to 9" photomasks
Prevents chrome contact, reducing contamination risks
Ideal for transfers, inspections, and cleaning processes
Antistatic, chemical-resistant for ISO 3 cleanroom use
Includes a pedestal holder for protection and cleanliness between uses

Go to WHS-L1 Mechanical Mask Pick Side

WHS‑L2: Offset Access for Special Fixtures

When a direct side approach isn’t possible, the L2’s horizontal offset design, a variation of the side grip photomask pick, fits into tight tool ports and carriers. This specialized photomask handling tool excels at loading metrology stages, cleaning stations, and bespoke mask fixtures.

Horizontal offset grip for 5" to 9" photomasks
Prevents chrome contact, minimizing contamination
Suitable for transfers, inspections, and mask aligners
Antistatic, chemical-resistant for ISO 3 cleanrooms
Comes with pedestal holder for protection between uses

Go to WHS-L2 Mechanical Mask Pick Horizontal Grip

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WHS‑L3: EUV Semiconductor Reticle Handling Performance

Engineered specifically for demanding reticle handling of EUV and other advanced lithography reticles, the L3 uses four precision grippers that mate seamlessly with EUV pod interfaces. Its compact footprint, ESD‑safe construction, and high‑grade materials keep valuable semiconductor reticles secure and contamination‑free.

4-gripper design for 6”x6” EUV reticles
Eliminates chrome contact, minimizing contamination
Fits standard EUV reticle storage pods
Shortened grippers for better control of reticles
Includes holder for protection between uses

Go to WHS-L3 IEV mask grip

Versatile Application Support for Photomask Lithography

Transfer & Loading: Safe movement of photomasks and semiconductor reticles between storage boxes, aligners, and exposure tools used in photolithography mask processes.
Inspection: Macro and micro checks for bar codes, chrome defects, pellicle frames, and particle contamination on the photomask.
Cleaning & Repair: Secure photomask handling during solvent immersion or spot‑cleaning routines.
Metrology & Mask Shops: Reliable service in microscopes, repairs, and mask‑making environments requiring precise reticle handling.