CMP Polishing Slurry Filtration Solution
Slurry particle CMP filters
Suitable for CMP polishing system in the slurry recirculation / global loop and at point-of-use (POU)
✔ PALL & ENTEGRIS COMPATIBLE ✔ VERY COMPETATIVE PRICING ✔ SHORT DELIVERY TIMES
The multi-layer Nano-fiber filter media provides high flow rates and dirt holding capacity. That effectively removes defective particles with the size distribution unchanged. Available with a retention rate from 11 µm down to 0,05 µm and almost everything in-between.
Benefits
• Multi-layer Nano-fiber media provides high flow rates and dirt holding capacity
• Multi-layer Nano-fiber media provides high flow rates and dirt holding capacity
• Strict Japanese quality assurance to ensure product stability
• Perfectly integrate depth, pleated and rolled technologies in filter design
• Effectively removes defective particles with the size distribution unchanged.
Provides long service life and high dirt holding capacity.
Provides long service life and high dirt holding capacity.
• One-piece construction means it’s easy to install, clean, and replace
SUITABLE FOR CMP POLISHING SYSTEM IN THE SLURRY RECIRCULATION / GLOBAL LOOP AND AT POINT-OF-USE
