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Spin process - 150 mm Integrators
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Spin process - 300 mm Integrators
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Wafer Cleaning
(1)
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(1)
Material
NPP
PTFE
Wafer size
Up to 8" (200 mm)
Substrate size
Up to 8" x 8"
Type
Integrator
Drive unit
Up to 12.000 RPM
Acceleration/Deceleration
1-30.000 RPM
Programs
CW & CCW puddle rotation options

Spin process - 300 mm Integrators

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wetprocess
SPIN300x Advanced - Spin coater POLOS® - Integrator Model
SPIN300x-Advanced-INT
Spin process - 300 mm Integrators
POLOS
SPIN300x Advanced - Spin coater POLOS® - Integrator Model
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2 Sizes:
SPIN300x Advanced - Spin coater POLOS® - Integrator Model NPPSPIN300x Advanced - Spin coater POLOS® - Integrator Model PTFE