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Spin process - 150 mm Integrators
(2)Spin process - 200 mm Integrators
(2)Spin process - 300 mm Integrators
(1)Wafer Cleaning
(1)Substrate Holder
(1)Material
NPP
PTFE
Wafer size
Up to 8" (200 mm)
Substrate size
Up to 6" x 6" (150 mm)
Up to 6” x 6”
Type
In-Deck Version
Integrator
Drive unit
Up to 12.000 RPM
Acceleration/Deceleration
1-30.000 RPM
Programs
CCW rotation and puddle option
CW
Spin process - 200 mm Integrators
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Cleaning
Refine
Category
Spin process - 150 mm Integrators
(2)Spin process - 200 mm Integrators
(2)Spin process - 300 mm Integrators
(1)Wafer Cleaning
(1)Substrate Holder
(1)Material
NPP
PTFE
Wafer size
Up to 8" (200 mm)
Substrate size
Up to 6" x 6" (150 mm)
Up to 6” x 6”
Type
In-Deck Version
Integrator
Drive unit
Up to 12.000 RPM
Acceleration/Deceleration
1-30.000 RPM
Programs
CCW rotation and puddle option
CW
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wetprocess
SPIN200x-Advanced-INT
Spin process - 200 mm Integrators
POLOS
wetprocess
SPIN200x-Standard-INT
Spin process - 200 mm Integrators
POLOS
Up to 8" (200 mm)
Up to 6" x 6" (150 mm)
In-Deck Version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW rotation and puddle option