Photolithography

Products for safe storage and handling of reticles,
as well as mask aligners and uv meters.

All photoresist

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Photo resist (7)
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Photolithography
APOL-LO 3200 Hi-Res Negative Lift-Off
APOL-LO 3200
Photo resist
Kemlab
APOL-LO 3200 Hi-Res Negative Lift-Off Photolithography » Photoresist » Photo resist
Negative Photoresist
2-10 µm FT
Negative Lift-Off
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Photolithography
HARE SQ™ Photoresist
HARE-SQ
Photo resist
Kemlab
HARE SQ™ Photoresist Photolithography » Photoresist » Photo resist
The HARE-SQ system is designed for use in thick film applications of 2 to 100 ?m, and is ideal for use in permanent applications
Negative Photoresist
2-200 µm FT
Negative Tone Epoxy
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Photolithography
HARP PMMA and Copolymer e-Beam Resists
HARP eB & HARP-C
Photo resist
Kemlab
HARP PMMA and Copolymer e-Beam Resists Photolithography » Photoresist » Photo resist
Positive Photoresist
up to 4.0 µm FT
PMMA e-Beam / Copolymer
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Photolithography
K-PRO™ Advanced Packaging Thick
K-PRO
Photo resist
Kemlab
K-PRO™ Advanced Packaging Thick Photolithography » Photoresist » Photo resist
K-PRO™ photoresists are advanced packaging positive resists for use in i-line, g-line and broadband packaging applications.
Positive Photoresist
5-50 µm FT
Advanced Packaging
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Photolithography
KL IR Image Reversal
KL-IR
Photo resist
Kemlab
KL IR Image Reversal Photolithography » Photoresist » Photo resist
Negative/Positive Photoresist
1-2.5 µm FT
Image Reversal Lift-Off
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Photolithography
KL 5300 Series General Purpose Positive Thin
KL5300
Photo resist
Kemlab
KL 5300 Series General Purpose Positive Thin Photolithography » Photoresist » Photo resist
Positive photoresist
0-2.5 µm FT
General Purpose Thin
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Photolithography
KL 6000 Series General Purpose Positive Thick
KL6000
Photo resist
Kemlab
KL 6000 Series General Purpose Positive Thick Photolithography » Photoresist » Photo resist
Positive Photoresist
2.5-12 µm FT
General Purpose Thick
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