Photoresist

Photolithography

APOL-LO 3200 Hi-Res Negative Lift-Off

APOL-LO 3200

Photo resist

Kemlab

Negative Photoresist

2-10 µm FT

Negative Lift-Off

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Photolithography

HARE SQ™ Photoresist

HARE-SQ

Photo resist

Kemlab

The HARE-SQ system is designed for use in thick film applications of 2 to 100 ?m, and is ideal for use in permanent applications

Negative Photoresist

2-200 µm FT

Negative Tone Epoxy

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Photolithography

HARP PMMA and Copolymer e-Beam Resists

HARP eB & HARP-C

Photo resist

Kemlab

Positive Photoresist

up to 4.0 µm FT

PMMA e-Beam / Copolymer

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Photolithography

K-PRO™ Advanced Packaging Thick

K-PRO

Photo resist

Kemlab

K-PRO™ photoresists are advanced packaging positive resists for use in i-line, g-line and broadband packaging applications.

Positive Photoresist

5-50 µm FT

Advanced Packaging

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Photolithography

KL IR Image Reversal

KL-IR

Photo resist

Kemlab

Negative/Positive Photoresist

1-2.5 µm FT

Image Reversal Lift-Off

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Photolithography

KL 5300 Series General Purpose Positive Thin

KL5300

Photo resist

Kemlab

Positive photoresist

0-2.5 µm FT

General Purpose Thin

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Photolithography

KL 6000 Series General Purpose Positive Thick

KL6000

Photo resist

Kemlab

Positive Photoresist

2.5-12 µm FT

General Purpose Thick

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