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Wetprocess
Photolithography
Thin-Films
Photolithography
Products for safe storage and handling of reticles,
as well as mask aligners and uv meters.
Photoresist
Photolithography
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Photolithography
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Photoresist
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Photo resist
(7)
Color
Overige
TAG 1
Negative Photoresist
Negative/Positive Photoresist
Positive Photoresist
TAG 2
0-2.5 µm FT
1-2.5 µm FT
2-10 µm FT
2-200 µm FT
2.5-12 µm FT
5-50 µm FT
up to 4.0 µm FT
TAG 3
Advanced Packaging
General Purpose Thick
General Purpose Thin
Image Reversal Lift-Off
Negative Lift-Off
Negative Tone Epoxy
PMMA e-Beam / Copolymer
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Photoresist
Photolithography
APOL-LO 3200 Hi-Res Negative Lift-Off
APOL-LO 3200
Photo resist
Kemlab
Negative Photoresist
2-10 µm FT
Negative Lift-Off
View product
Photolithography
HARE SQ™ Photoresist
HARE-SQ
Photo resist
Kemlab
The HARE-SQ system is designed for use in thick film applications of 2 to 100 ?m, and is ideal for use in permanent applications
Negative Photoresist
2-200 µm FT
Negative Tone Epoxy
View product
Photolithography
HARP PMMA and Copolymer e-Beam Resists
HARP eB & HARP-C
Photo resist
Kemlab
Positive Photoresist
up to 4.0 µm FT
PMMA e-Beam / Copolymer
View product
Photolithography
K-PRO™ Advanced Packaging Thick
K-PRO
Photo resist
Kemlab
K-PRO™ photoresists are advanced packaging positive resists for use in i-line, g-line and broadband packaging applications.
Positive Photoresist
5-50 µm FT
Advanced Packaging
View product
Photolithography
KL IR Image Reversal
KL-IR
Photo resist
Kemlab
Negative/Positive Photoresist
1-2.5 µm FT
Image Reversal Lift-Off
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Photolithography
KL 5300 Series General Purpose Positive Thin
KL5300
Photo resist
Kemlab
Positive photoresist
0-2.5 µm FT
General Purpose Thin
View product
Photolithography
KL 6000 Series General Purpose Positive Thick
KL6000
Photo resist
Kemlab
Positive Photoresist
2.5-12 µm FT
General Purpose Thick
View product