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Maskless Lithography Systems
(6)
Height
520 mm
600 mm
736 mm
Width
360 mm
520 mm
600 mm
Depth
360 mm
600 mm
690 mm
Wafer size
100 x 100 mm
106 x 106 mm
150 x 150 mm
4"
System type
Bench-top
Table-top System
Structure
< 300 nm features
Very quick 2D Printer

Maskless lithography UV Direct Laser Writer

The POLOS NanoWriter Series is a versatile UV DIrect Laser Writer Series with ultra high precision components, specifically designed to give the user the highest degree of freedom to create microstructures in photosensitive layers. It has the highest resolution in the market with a 405 nm laser

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photolithography
Beam Maskless Lithography System
Maskless Lithography Systems
POLOS
POLOS Beam
106 x 106 mm
Bench-top
Photolithography
NW-100
Maskless Lithography Systems
POLOS
POLOS NanoWriter - UV Direct Laser Writer
A versatile UV laser writer with high precision components to get the highest degree of freedom to create microstructures in photosensitive layers.
100 x 100 mm
Photolithography
NWA-100
Maskless Lithography Systems
POLOS
POLOS NanoWriter Advanced - UV Direct Laser Writer
POLOS NanoWriter Advanced is a Laser Writer with highest degree of freedom to create microstructures in photosensitive layers.
100 x 100 mm
Table-Top System
< 300 nm features
photolithography
POLOS-PrintUV-Standard
Maskless Lithography Systems
POLOS
POLOS PrintUV Standard
4"
Table-top System
photolithography
POLOS® BEAM XL Mk2
Maskless Lithography Systems
POLOS
POLOS BEAM XL
150 x 150 mm
Bench-top
Photolithography
POLOSprinter
Maskless Lithography Systems
POLOS
POLOS µPrinter - up to 4" (100 mm)
POLOS table top micro printer can produce and 2D shapes at micron resolution without the need for a hard-mask
100 x 100 mm
Table-top System
Very quick 2D Printer