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Material

Material: Steel housing

NPP

Wafer size

450 mm (15")

Substrate size

10" x 10" square substrates and bigger

Type

Stand alone system

Programs

CCW Rotation and Puddle option

CW

450 MM

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photolithography

POLOS450-NPP Advanced PP Spin Processor

44399

450 MM

POLOS

POLOS450-NPP Advanced PP Spin Processor

450 mm (15")

10" x 10" square substrates and bigger

Stand alone system

CW, CCW Rotation and Puddle option

Photolithography

POLOS SPIN5000A Spin Coater System

POLOS-SPIN5000A

450 MM

POLOS

POLOS SPIN5000A Spin Coater System

450 mm (15")

10" x 10" square substrates and bigger

Stand alone system

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