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Material
NPP
PTFE
Wafer size
200 mm (Up to 8")
Substrate size
Up to 6" x 6" (150 mm)
Type
Tabletop
Drive unit
Up to 12.000 RPM
Acceleration/Deceleration
1-30.000 RPM
Programs
CCW rotation and puddle option
CW
CW & CCW puddle rotation options

200 MM

2products
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photolithography
SPIN200x-Advanced-TABLETOP
200 MM
POLOS
SPIN200x Advanced - Spin coater POLOS®
200 mm (Up to 8")
Up to 6" x 6" (150 mm)
Tabletop
Up to 12.000 RPM
1-30.000 RPM
CW & CCW puddle rotation options
2 Sizes:
SPIN200x Advanced - Spin coater POLOS® NPPSPIN200x Advanced - Spin coater POLOS® PTFE
photolithography
SPIN200X-Standard-TABLETOP
200 MM
POLOS
SPIN200x Standard - Spin coater POLOS®
200 mm (Up to 8")
For up to 6" x 6" (150 mm)
Tabletop
Up to 12.000 RPM
1-30.000 RPM
CW, CCW Rotation and Puddle option
2 Sizes:
SPIN200x Standard - Spin coater POLOS® NPPSPIN200x Standard - Spin coater POLOS® PTFE