Concentration Monitor CMP
Categories
KxS Technologies delivers advanced in-line refractive index measurement solutions for semiconductor fabs. Our DCM-10 Inline Concentration Monitor ensures precision, speed, stability and reliability in chemical concentration control, helping customers achieve yield improvement, enhanced process control and stability as well as cost efficiency.
Application Areas:
CMP Slurry Monitoring
• Maintain correct slurry density and oxidizer concentration (H₂O₂) for copper, tungsten, and ILD planarization.
• Prevent defects, improve yield, and reduce cost-of-ownership.
• Inline refractive index measurement correlates slurry composition with wafer planarization performance.
Post-CMP Cleaning
• Extend bath life and maintain chemical integrity in cleaning solutions.
• Reduces chemical waste and ensures consistent wafer surface quality.
