Refine
Category
150 MM
(4)200 MM
(2)300 MM
(3)450 MM
(2)Spray Coating
(4)Options POLOS
(10)Chuck
(11)Chuck Adapter
(5)Chuck Foil
(2)Spin Stations
(1)Material
N/A
Wafer size
Lid and Bowl Liner
Substrate size
Thickness: 0.5 mm
Type
Consists of 20 sets
Frequency: 50 Hz
Hands-free usage
Programs
Vacuum activation
Options POLOS
10products
Order by
Filter
Coating
Refine
Category
150 MM
(4)200 MM
(2)300 MM
(3)450 MM
(2)Spray Coating
(4)Options POLOS
(10)Chuck
(11)Chuck Adapter
(5)Chuck Foil
(2)Spin Stations
(1)Material
N/A
Wafer size
Lid and Bowl Liner
Substrate size
Thickness: 0.5 mm
Type
Consists of 20 sets
Frequency: 50 Hz
Hands-free usage
Programs
Vacuum activation
Apply filters
Photolithography
29243
Options POLOS
POLOS
Photolithography
37596
Options POLOS
POLOS
photolithography
42870
Options POLOS
POLOS
Hands-free usage
Vacuum activation
Photolithography
8100025510
Options POLOS
POLOS
Photolithography
DS-PER- X100
Options POLOS
POLOS
Performus™ X100 dispenser system increase throughput, improve yields, and reduce production costs through controlled application of adhesives, lubricants,
photolithography
DS-PER-X15
Options POLOS
POLOS
Performus™ X15 dispenser system increase throughput, improve yields, and reduce production costs through controlled application of adhesives, lubricants,
Photolithography
DV-PTFE
Options POLOS
POLOS
Photolithography
SHSK
Options POLOS
POLOS
Photolithography
SPIN150x-LNR
Options POLOS
POLOS
Lid and Bowl Liner
Thickness: 0.5 mm
Consists of 20 sets