SPIN300x Advanced - Spin coater POLOS® PTFE

The POLOS® SPIN300x is designed for large-format substrate processing up to 300 mm. As the largest model in the SPINx range, it combines the flexibility of a modular spin processor with features aimed at demanding R&D applications and automated production environments.

The SPIN300x is supplied as an Advanced configuration with a Natural Polypropylene (NPP) process chamber. For applications involving more aggressive chemistries, a PTFE chamber is available as an option. The standard configuration includes an automatic lid, while additional options include a dispense vessel, linear dispense arm and backside rinse.

With capacity for wafers up to 300 mm (12") and square substrates up to 200 × 200 mm, the SPIN300x provides a practical solution for large-format wet processing and applications that require room for future process development.

Suitable for a wide range of processes

The SPIN300x can be used for numerous wet processing steps, including:

• Coating
• Cleaning
• Rinse & dry
• Developing
• Etching
• PDMI and related processes

Tabletop or in-deck installation

The SPIN300x can be configured for either standalone tabletop operation or direct integration into a process deck. Its housing and drainage system are designed to accommodate both installation methods without changing the core processing platform.

The modular architecture also leaves room for process-specific accessories and dispensing equipment, making it possible to expand the system as application requirements develop.

Designed for automated handling

The SPIN300x supports integration with robotic wafer-handling equipment through programmable motor homing positions. This allows the chuck position to be aligned with the requirements of an automated handling system.

The elevated vacuum chuck extends above the process bowl, providing clear access to the substrate. Wafers and samples can therefore be loaded or retrieved using tweezers, vacuum wands or robotic end-effectors with minimal obstruction.

Automatic lid for streamlined operation

The automatic lid is operated through the touchscreen and can also be controlled using an optional foot pedal. This provides convenient hands-free operation, particularly when working with gloves or inside a glovebox.

Lid movement can also be incorporated into the process recipe, including automatic opening when a process has finished. This helps reduce manual intervention during repetitive workflows.

Protection against accidental liquid ingress

An integrated liquid filter trap provides an additional layer of protection for the vacuum and drive system. Located between the process chamber and vacuum lines, it captures process liquids before they can reach sensitive components such as the drive unit, vacuum sensor, vacuum valve or ServoBL Controller.

The collected liquid is held in a removable container that can be viewed through the side of the housing. This makes it easy to check the trap during routine maintenance and remove collected fluids when necessary.

SPIN300x hardware specifications

Process chamber

• Natural Polypropylene (NPP) as standard
• Optional PTFE construction
• Supports wafers up to 300 mm (12") or square substrates up to 200 × 200 mm
• Integrated liquid filter trap
• Automatic lid with optional foot-pedal operation
• Programmable motor homing
• Center-mounted syringe or dispense nozzle holder
• Lid lock and vacuum sensor
• Detachable touchscreen display
• USB connection for recipe storage and software updates

Drive unit

• Clockwise and counter-clockwise rotation
• Puddle mode
• Convertible tabletop or in-deck configuration