SPIN100x - Standard - NPP

POLOS® SPIN100x Spin coater - Standard - Tabletop model

Clean, High-Quality and Cost-Effective

The POLOS® SPIN100x brings reliable control and consistency to your coating and spin-processing applications. Designed as a clean, high-quality and cost-effective solution, the SPIN100x offers the essential functionality you need without unnecessary complexity.

Available in durable Natural Polypropylene (NPP), the SPIN100x provides excellent chemical resistance and long-term durability. Supporting a broad range of substrates, the SPIN100x handles wafers up to 100 mm (4"), as well as samples up to 3 x 3" square substrates. This flexibility makes it an excellent choice for both R&D environments and small-scale production workflows.

Designed for Flexibility
The SPIN100x features a compact and practical design for easy integration into your laboratory or production environment. Its modular construction allows the system to be adapted to different application requirements. The system can be configured for tabletop or in-deck installation, offering a convenient solution for different workspace and process requirements.

Hardware specifications SPIN100x:

Process chamber

• Material: Natural Polypropylene (NPP)
• Substrate capacity: Up to 4” (100 mm) wafers or up to  3 x 3" square substrates
• Safety features: lid lock
• Large detachable touchscreen interface
• USB port for recipe storage and software updates

Specifications drive-unit

• Brushless indirect drive, speeds up to 12,000 RPM
• Precision acceleration and speed control from 1 – 30,000 RPM
• Rotation modes: CW, CCW, and puddle mode
• Unique convertible design for tabletop or in-deck configuration

Included chuck

• Universal mechanical chuck (no vacuum)