POLOS SPIN500x Advanced PTFE

The POLOS^® SPIN500x is a large-format spin processor designed to handle substrates up to 450 mm. As the largest system in the SPINx series, it combines modular construction with advanced process control, making it suitable for demanding research applications and automated production environments.

Built for consistent processing, the SPIN500x delivers reliable coating uniformity and precise operational control. Available exclusively in the Advanced configuration, it features a Natural Polypropylene (NPP) construction, with an optional PTFE version for applications involving aggressive chemicals.

The system accommodates round wafers up to 450 mm in diameter and square substrates up to 350 × 350 mm. Its versatile design supports both laboratory research and integration into automated, high-volume production lines.

Flexible, modular construction

The SPIN500x can be configured for tabletop use or integrated directly into a process deck. Its housing and integrated drain design make conversion between these installation formats straightforward. A range of optional accessories further extends the system's capabilities, helping optimize dispensing, improve ease of use, and adapt the processor to changing process requirements.

Designed for automation

Programmable motor homing positions support accurate alignment with robotic wafer handling equipment, simplifying integration into automated and semi-automated production lines. The raised vacuum chuck extends above the bowl rim, providing unobstructed substrate access for handling with tweezers, vacuum wands, or robotic end-effectors.

Automated lid control

The lid can be operated through the touchscreen or an optional foot pedal, supporting convenient hands-free operation and use in glovebox environments. Users can also program the lid to open automatically when a process recipe finishes, helping reduce manual intervention and streamline workflows.

Integrated liquid filter trap

A liquid filter trap protects critical system components by capturing liquids that accidentally enter the vacuum lines. Positioned between the process chamber and vacuum system, it helps prevent fluid from reaching components such as the drive unit, vacuum sensor, valve, and ServoBL Controller. The collected liquid is held in a removable container that can be inspected through a side window, simplifying routine maintenance.

SPIN500x hardware specifications

Process chamber

• PTFE
• Supports wafers up to 450 mm (15”) or square substrates up to 350 × 350 mm
• Integrated liquid filter trap
• Automatic lid with optional foot-pedal operation
• Programmable motor homing
• Center-mounted syringe or dispense nozzle holder
• Lid lock and vacuum sensor
• Detachable touchscreen display
• USB connection for recipe storage and software updates

Drive unit

• Clockwise and counterclockwise rotation
• Puddle mode
• Convertible tabletop or in-deck configuration