POLOS PC320 Photoresist Spray Coating System

Our POLOS^® PC320 table-top photoresist spray coating system utilizes a unique ultrasonic spray coating technology to evenly coat the photoresist on the surfaces of substrates such as MEMs, wafers, masks, and other substrates with various topographies.

Our systems allow high-precision nano-particle coating with more efficient photoresist consumption compared to standard photoresist application techniques. On our ultrasonic spray coating systems, the material usage ratio exceeds 95%, which allows our users to reduce the costs of photoresist consumption and improve their process efficiency.

Listening to the needs of our customers, we designed a compact system with easy-to-use software controls, the ability to choose from a wide range of Ultrasonic Nozzles, and complementary options that will allow our customers to find the perfect match for their process application.

The POLOS^® PC320 is a benchtop coating system especially for photoresist coating. It is suitable for wafers up to 150 mm (6"). The thickness of the photoresist coating is usually 1 to 100 microns. It is equipped with a vacuum heating plate that can be adjusted to wafers of different sizes. The unique ultrasonic atomization technology can deposit photoresist coatings with a uniformity of over 95%. It is equipped with a vacuum heating plate, which can be adapted to wafers of different sizes.

Key features

• Bench-top system
• Better coverage of microstructure and controllable coating area than spin coating
• High-precision nanoparticle coating due to Ultrasonic Nozzle, material consumption ratio > 95%
• Compatible with all series of POLOS^® by Siansonic^® nozzles; spray width from 1 mm to 100 mm and flow rate of 0.001 ml/min - 50 ml/min
• Max. spray area: 150 mm x 150 mm (6")
• Uniformity: >95%
• Photoresist viscosity: <50 cps
• Thickness of coating: 1 - 100 micron (depending on material)
• XYZ servo motion system
• Precision syringe pump
• Exhaust system
• Laser light for the positioning of the nozzle
• Switchable multi-channel vacuum heating plate for wafers of 2", 4”, and 6”

Options

• Vacuum heating plate with a maximum temperature of 150°C.
• Ultrasonic bath: used to pre-disperse the coating liquid.
• Ultrasonic syringe: Used to provide nanoparticle dispersion during the liquid delivery process and to avoid the solid settlement during spray coating.
• Standard reservoir