Wafer handling products

Mechanical Wafer Pick Edge grip with spatula

Mechanical Wafer Pick Edge grip with spatula
Wafer handling products

Mechanical Wafer Pick Edge grip with spatula

Choose your size:
Knife-edge spatula for precise wafer lifting from hot surfaces 
Handles wafers on hotplates and platens up to 160°C
 3 mm perfluorocarbon touchpad for scratch-free contact
Ergonomic design with easy trigger for secure handling

WHS-G2 Manual Mechanical Wafer Pick with Spatula Knife Edge

The WHS-G2 series is an advanced manual wafer handling tool, designed specifically for applications requiring precise wafer manipulation on flat surfaces. A sister product to the WHS-G1, the WHS-G2 features a knife-edge spatula, ideal for lifting wafers from hotplates, platens, or vacuum chucks. This normally-closed, edge-only mechanical gripper accommodates wafers with thicknesses ranging from 120 μm to 1000 μm, ensuring secure handling in a variety of semiconductor processes.

The knife-edge spatula is compatible with surfaces up to 160°C, making the WHS-G2 an ideal solution for high-temperature wafer handling. The bottom gripper is constructed from ESD-safe PEEK for durability, antistatic protection, and chemical resistance. The top gripper side of the tool features a 3 mm perfluorocarbon elastomer touchpad, which provides gentle, secure contact without risking scratches or contamination.

The ergonomic handle and easy-to-use trigger design enhance operator control and reduce fatigue, enabling safe handling of SEMI Standard round substrates, both silicon and compound wafers. In addition to standard wafer handling tasks such as manual transferring and sorting, the WHS-G2 is suited for specialty handling applications, including bonded and Taiko wafers, optical components, and MEMS devices.

Offering a cost-effective alternative to vacuum wands and tweezers, the WHS-G2 ensures precise handling without scratching or leaving debris. Manufactured in an ISO9001certified facility and with CE certification, the WHS-G2 meets international standards for performance and safety, making it an indispensable tool in cleanroom environments.

Other products of interest

wafer-handling
WHS-G1-6
Wafer Edge Pick
Wafer handling products
Mechanical Wafer Pick Edge grip 150 mm
WHS-G1 Serie MCP2-8 A normally closed (consistent-Force) edge exclusion mechanical pick For handling 50 mm up to 200 mm round substrates from the wafer edge.
150 mm
Antistatic PEEK
Perfluorocarbon elastomer
Normally closed
ISO 4 (Class 10 FS209E)
wafer-handling
WHS-P4-301
1-wafer presenter
Wafer handling products
Manual Single Wafer Presenter 76 mm (3”)
Manual
76 mm (3”)
25-Slots
wafer-handling
WHS-V1-PI3NST
Vacuum and Vespel Tips
Wafer handling products
Vacuum Tip Polyimide 150 mm Knife Edge (for silicon and glass wafers)
High-temperature Polyimide vacuum wand tip for special handling of substrates to/from a platen, evaporator, hotplate or flat surface in a cleanroom environment.
150 mm
Vacuum Tip Assembly
wafer-handling
WHS-V6-200
Cordless Portable Wand
Wafer handling products
Cordless portable vacuum wand (WHS-V6) 100-200 mm
The WHS-V6 Serie FWCR2 is a dvanced technology 150-200 mm cordless portable battery-powered vacuum wand allows independance from vacuum lines. Provides mobility
100-200 mm
Including: WHS-V1-AP4NST PEEK Vacuum Tip