KL5300 series are positive photoresists for use in i-Line, g-Line and broadband applications. They offer high sensitivity, high resolution and excellent process latitude.
 

• Cover 0 – 2.5 µm in a single coat
• Designed for use with industry standard TMAH 0.26N developers
• Achieve resolution 0.55 µm
• Competes with S1805™, S1808™, S1811™, S1813™, S1818™