CMP-RF depth filter

esPRO’s CMP-RF nano fiber depth filter represents a breakthrough in advanced filtration technology, offering superior performance compared to traditional blown melt filtration media commonly used in CMP slurry applications. These proprietary, patented designs feature a multilayer construction, combining PP media with a nano fiber membrane for enhanced filtration efficiency.

The CMP-RF filter’s unique tapered pore structure ensures progressive contaminant capture, making it an economical and highly effective solution for polishing applications. Its depth filtration design is engineered to handle high contaminant loads, providing a longer service life and reducing the need for frequent filter replacements.

Constructed with a PP (polypropylene) core, the CMP-RF depth filter is designed for durability in challenging environments, with a maximum working temperature of 80°C (176°F). Available in Ø69 mm configurations with or without a protective cage, this filter offers flexibility for various filtration setups.

The CMP-RF nano fiber depth filter delivers advanced filtration, making it the ideal choice for industries requiring superior filtration performance in CMP slurry and polishing processes.