CFTHE Three-hole Lithography Capsule Filter

esPRO’s CFTHE Three-Hole Capsule Filter is specifically designed for efficient filtration of small to medium flow rates in semiconductor lithography applications.

Optimized for point-of-use (POU) filtration, the CFTHE series features non-prewetted PTFE membranes, which maximize membrane efficiency and ensure maximum flow rates in photoresist filtration processes.

With its compact and stable design, the CFTHE capsule filter allows for quick and easy installation, requiring no tools for filter changes or draining. This innovative design minimizes drips and ensures a clean, smooth filter changeout process, which is critical for maintaining system cleanliness in demanding semiconductor applications.

Constructed from high-quality polypropylene (PP), the capsule is sealed with FFKM for superior chemical compatibility and durability. The filter media includes PTFE, PP, UPE, or N66, supported by a PP capsule. Available in 2.5" and 5" lengths, the 68mm diameter design is adaptable for various system configurations.

The CFTHE series offers eight different removal ratings, making it versatile for a wide range of filtration requirements. Operating under a maximum differential pressure of 0.39 MPa at 25°C and a maximum operating pressure of 0.27 MPa at 25°C, this filter is capable of withstanding temperatures up to 40°C, providing reliable performance in high-demand lithography applications.

All esPRO filter products, including the CFTHE series, are manufactured in a cleanroom environment, ensuring the highest levels of cleanliness and quality, which is critical for applications requiring ultrapure filtration solutions.