APOL-LO 3200 Series resist is a negative tone advanced photoresist
with a lift-off profile for i-Line and broadband applications.
 

• Improved resolution
• Wider process latitude
• Film Thickness range of 2 – 10+ µm
• Designed for use with industry standard developers
• Customization available to:
• Adjust Lift-Off Angle
• Adjust PhotoSpeed
• Competes with AZ® nLOF™ 2020, AZ® nLOF™ 2035, AZ® nLOF™ 2070