8" Mask Aligner and Exposure System - 2 kW UV Lamp

8" Mask Aligner and Exposure System - 2 kW UV Lamp

Number: MDA-80SA
Price on quote


Substrate size
8" (200mm)
System type
Semi Automatic
Light source
2 kW UV Lamp


Mask Aligners Brochure 2017


Product description

8" Mask Aligner and Exposure System

Model: MDA-80SA

The MDA-80SA is a brand new model and respresents next generation of Full-Field lithography systems. This brand new Semi Automatic Aligner platform offers a higher overlay accuracy and more reliable operation. Joystick control and touch panel are more user friendly to acces in your process.

  • Type: Joystick control Semi-Auto (Mask Aligner)
  • Mask size: up to 9" x 9"
  • Substrate size: piece to 8" x 8"
  • UV lamp& Power: 2kW & power supply
  • Uniform beam size: 10.25" x 10.25"
  • Beam Uniformity:<±3~5% >
  • Beam wavelength: 350 ~ 450nm
  • 365nm Intensity: 15 ~ 25mW/cm2
  • Alignment accuracy: 1um
  • Process resolution: 1um@1um PR thickness with vacuum contact
  • Process mode: Soft, Hard, Vacuum contact& Proximity
  • Substrate chuck moving: x,y,z& (theta) (Motorized)