6" Mask Aligner and Exposure System - 350W UV Lamp

6" Mask Aligner and Exposure System

Model: MDA-600S

The MDA-600S is widely used for MEMS, LED and Semiconductor industry. It can provide a higher performance of alingment accuracy and resolution. It is an ideal and economical tool for Universities and Research Centers.

Specifications:

• Type: PC control semi auto
• Mask size: up to 7" x 7"
• Substrate size: piece to 6"
• UV lamp & Power: 350W & power supply
• Uniform beam size: 6.25" x 6.25"
• Beam Uniformity: <±5%
• Beam wavelength: 350 ~ 450nm
• 365nm Intensity: ~25mW/cm2
• Alignment accuracy: 1um
• Process resolution: 1um@1um PR thickness with vacuum contact
• Process mode: Soft, Hard, Vacuum contact & Proximity
• Substrate chuck moving: x,y,z & (theta)