4" UV Exposure System (Manual)

4" UV Exposure System (Manual)

The Exposure system is good for research and variable processes of all applications. It represents next generation of full-field lithography systems.

Standard Features:

• Manual Control system
• Sample size : Up to 4" wafer
• UV lamp : 350W
• 350W Power Supply
• UV Exposure Light source
• Dimension : 1000 (W) x 917 (D) x 781(H) mm
• Weight : 120 Kg

System specification
A. Light source module

• UV light source : 350nm to 450nm
• 365nm Intensity : 20~30 mW/cm2
• Max. Beam Size : 4.25" x 4.25"
• Beam Uniformity : 3%(4" wafer)

B. Utilities requirement

• Electric power : 220VAC, 50/60Hz, 15 Amp, single phase with Ground
• Nitrogen :>40 psi ( 3kg/cm2), 6mm tube