12" Mask Aligner & Exposure System - 5 kW UV Lamp

12" Mask Aligner & Exposure System

Model: MDA-12FA

The MDA-12FA represents the next generation of Full-Field lithography systems. This model offers a full autotomic mask aligner platform with a higher overlay accuracy and more reliable operation the conventional systems. The MDA-12SA has a higher production and user friendly controls.

Specifications:

• Type: Full automatic (Mask Aligner)
• Mask size: up to 14" x 14"
• Substrate size: 12" circle
• UV lamp& Power: 5kW lamp & power supply
• Uniform beam size: 13.25" x 13.25"
• Beam Uniformity:<±5% >
• Beam wavelength: 350 ~ 450nm
• 365nm Intensity: 25~60mW/cm2 (5kW)
• Alignment accuracy: 1um
• Process resolution: 1um@1um PR thickness with vacuum contact
• Process mode: Soft, Hard, Vacuum contact& Proximity
• Substrate chuck moving: x,y,z& (theta) (Motorized)
• Pre-aligner: ±50um