12" Mask Aligner & Exposure System - 2-5 kW UV Lamp

12" Mask Aligner & Exposure System

Model: MDA-12SA

The MDA-12FA represents the next generation of Full-Field lithography systems. This model offers a semi-autotomic mask aligner platform with a higher overlay accuracy and more reliable operation the conventional systems. It is great for Ceramic, Probe Card and WLP applications. The MDA-12FA has a higher production and user friendly controls.

Specifications:

• Type: Joystick control Semi-Auto (Mask Aligner)
• Mask size: up to 13" x 13"
• Substrate size: piece to 12" x 12"
• UV lamp & Power: 2kW & power supply 5kW & Power supply
• Uniform beam size: 13.25" x 13.25"
• Beam Uniformity: <±5%
• Beam wavelength: 350 ~ 450nm
• 365nm Intensity: 15 ~ 20mW/cm2 (2kW) 25 ~ 60mW/cm2 (5kW)
• Alignment accuracy: 1um
• Process resolution: 1um@1um PR thickness with vacuum contact
• Process mode: Soft, Hard, Vacuum contact & Proximity
• Substrate chuck moving: X ,Y, Z & (theta) (Motorized)
• Frame: Anti-Vibration system